US 2023/0405572 A1Published application

Self-cleaning fabric and article

AssigneeCity University of Hong Kong

InventorsJin Shang, Tianqi Wang, Mingzhe Sun

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Abstract

A self-cleaning fabric having a photocatalyst responsive to UV, visible and IR irradiations for inactivating harmful microorganisms via photocatalysis.

Claims27

Dependent claims

A self-cleaning fabric, comprising:

a photocatalyst responsive to UV, visible and IR irradiations for inactivating harmful microorganisms via photocatalysis.

Dependencies are inferred from the claim text.

Facts

Application: 17/843,143Filed 17 Jun 2022
Published: 21 Dec 2023
Term ends: Not estimatedThe source records don’t support an estimate.

Classification21 codes

B01J 35/58
Characterised by their shape or configuration: fabrics or filaments
B01J 29/70
Crystalline aluminosilicate zeolites; Isomorphous compounds thereof: of types characterised by their specific structure not provided for in groups…
B01J 29/7015
Of types characterised by their specific structure not provided for in groups B01J29/08 - B01J29/65: cHA-type, e.g. Chabazite, LZ-218
B01J 31/06
Containing organic compounds or metal hydrides: containing polymers

Family

US 11,925,928 B2Related patent
US 2023/0405572 A1This patent

From the US filing history. Foreign family members aren’t listed.

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