Composition for blocking ultraviolet rays and fine dust, and preparation method thereof
AssigneeSang Hwang Mi-in Co., Ltd.
InventorYoungsang Shin
Life of this patent
Estimating the term…
Abstract
A composition for treating skin damage caused by fine dust and ultraviolet rays according to the present invention contains extracts of black hoof mushrooms, shiitake mushrooms and oyster mushrooms, uses natural ingredients as the main ingredients, thus having the effect of relieving heavy metal damage and skin irritation caused by fine dust and ultraviolet rays without irritating the skin, and has the effect of protecting the skin.
Claims7
(canceled)
A cosmetic composition for caring for skin damage from fine dust and ultraviolet rays, comprising an extract of a black hoof mushroom, a shiitake mushroom, and an oyster mushroom.
3-4. (canceled)
The composition for caring for skin damage of 2, wherein the extract is included at 0.001 to 5 wt % of a total weight of the composition.
A method of preparing a cosmetic composition for caring for skin damage from fine dust and ultraviolet rays, the method comprising:
- (A) an ultra-high pressure pre-treatment of putting a black hoof mushroom, a shiitake mushroom, and an oyster mushroom, or a black hoof mushroom, a shiitake mushroom, and an oyster mushroom to which an extraction solvent is added in a plastic pouch and sealing the pouch, and performing a pressure treatment with water under conditions of 40 to 50° C. and 60 to 80 MPa for 100 to 120 minutes;
- (B) a subcritical extraction of adding an extraction solvent and performing extraction under conditions of 120 to 200° C. and a pressure of 0.1 to 15 MPa for 10 to 30 minutes;
- and
- (C) performing filtration.
A cosmetic composition comprising an extract of a black hoof mushroom, a shiitake mushroom, and an oyster mushroom as an effective component at 0.01 to 15 wt % with respect to a total weight of the cosmetic composition, the extract of a black hoof mushroom, a shiitake mushroom, and an oyster mushroom being prepared by an ultra-high pressure pre-treatment of pressurizing a black hoof mushroom, a shiitake mushroom, and an oyster mushroom with water under conditions of 40 to 50° C. and 60 to 80 MPa for 100 to 120 minutes, and then adding a solvent to the pre-treated black hoof mushroom, shiitake mushroom, and oyster mushroom and performing subcritical extraction under conditions of 120 to 200° C. and 0.1 to 15 MPa for 10 to 30 minutes.
Dependencies are inferred from the claim text.