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US 2023/0403778 A1Published application
Rotating target for extreme ultraviolet source with liquid metal
AssigneeKLA Corporation
InventorsAlexander Bykanov, Rui-Fang Shi
Life of this patent
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Abstract
An extreme ultraviolet (EUV) light source includes a vacuum chamber with a rotating target assembly therein. The rotating target assembly has an annular groove with a distal wall relative to an axis of rotation. The distal wall includes a porous region. The rotating target assembly is rotated to form a target by centrifugal force with a layer of molten metal on a distal wall of an annular groove in the rotating target assembly.
Claims21
A system comprising:
- a vacuum chamber;
- and
- a rotating target assembly having an annular groove with a distal wall relative to an axis of rotation, wherein the rotating target is disposed in the vacuum chamber, and wherein the distal wall includes a porous region.
A method comprising:
- rotating a rotating target assembly in a vacuum chamber thereby forming a target by centrifugal force as a layer of molten metal is disposed on a distal wall of an annular groove in the rotating target assembly, wherein the distal wall includes a porous region;
- directing a pulsed laser beam through an input window of the vacuum chamber;
- irradiating the target on the distal wall with the pulsed laser beam;
- and
- directing a generated short-wavelength radiation beam from the target.
2 more elements
Dependencies are inferred from the claim text.