Semiconductor Device and Method of Selective Shielding Using FOD Material

Abstract

A semiconductor device has a substrate and first electrical component disposed over the substrate. A first shielding layer is disposed over the first electrical component. A first film material is disposed between the first electrical component and first shielding layer for selective attachment of the first shielding layer. A second electrical component can be disposed over the substrate. A second shielding layer is disposed over the second electrical component, and a second film material disposed between the second electrical component and second shielding layer. A third shielding layer can be disposed over the first shielding layer, and a third film material disposed between the first shielding layer and third shielding layer. A fourth film material can be disposed between the first electrical component and substrate. An encapsulant is deposited over the first electrical component and substrate. A fourth shielding layer is formed over the encapsulant.

Dependencies are inferred from the claim text.