System for non radial temperature control for rotating substrates

A controller comprising software configured to:

• rotate a substrate on a substrate support;
• heat the substrate by directing energy towards a processing volume;
• and
• sample a sensor directed to a radial location at a frequency equal to or higher than a rotation frequency of substrate rotation to measure temperatures at a plurality of points at the radial location;
• and
• adjust at least one of power level, frequency, phase, or amplitude of one or more heating elements according to the measured temperatures of the plurality of points.

A processing chamber, comprising:

• a chamber body defining a processing volume;
• a quartz window;
• a substrate support disposed in the processing volume;
• a first heating source operable to direct energy towards the processing volume through the quartz window, wherein the first heating source comprises a plurality of heating elements grouped in a plurality of concentric heating zones;
• a temperature sensor configured to measure temperatures at a plurality of locations;
• and
• a second heating source operable to direct pulsed energy towards the processing volume.