Substrate processing apparatus and substrate processing method

A substrate processing apparatus, comprising:

• a liquid processing apparatus configured to form a liquid film on a surface of a substrate;
• a supercritical drying apparatus configured to dry the substrate by replacing the liquid film with a supercritical fluid;
• a first load-lock apparatus configured to switch an atmosphere around the substrate from a first one of a normal pressure atmosphere and a decompressed pressure atmosphere to a second one of the normal pressure atmosphere and the decompressed pressure atmosphere on a transfer path of the substrate;
• a dry-cleaning apparatus configured to dry-clean the surface of the substrate under a decompressed pressure;
• and
• a control device configured to perform forming of the liquid film by the liquid processing apparatus, drying of the substrate by the supercritical drying apparatus, switching of the atmosphere around the substrate by the first load-lock apparatus, and dry-cleaning of the substrate by the dry-cleaning apparatus in this order.