Gas abatement by plasma
OwnerSimone Magni, Neil Condon +1inventors
InventorsSimone Magni, Neil Condon, Erik Wagenaars
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Abstract
A plasma abatement apparatus includes: a plasma device configured to generate a plasma stream from a plasma gas; an effluent stream aperture configured to convey the effluent stream into the plasma stream for treatment by the plasma stream; a first aperture positioned to deliver a reducing reactant to a first region of the plasma stream; and a second aperture positioned to deliver an oxidising reactant to a second region of the plasma stream, wherein the second region is located at a position of the plasma stream which is cooler than the first region.
Claims18
A plasma abatement apparatus for treating an effluent stream from a semiconductor processing tool, said plasma abatement apparatus comprising:
- a plasma device configured to generate a plasma stream from a plasma gas;
- an effluent stream aperture configured to convey said effluent stream into said plasma stream for treatment by said plasma stream;
- a first aperture positioned to deliver a reducing reactant to a first region of said plasma stream;
- and
- a second aperture positioned to deliver an oxidising reactant to a second region of said plasma stream, wherein said second region is located at a position of said plasma stream which is cooler than said first region.
A method of treating an effluent stream from a semiconductor processing tool, comprising:
- generating a plasma stream from a plasma gas;
- conveying said effluent stream into said plasma stream for treatment by said plasma stream;
- delivering a reducing reactant to a first region of said plasma stream;
- and
- delivering an oxidising reactant to a second region of said plasma stream which is located at a position of said plasma stream which is cooler than said first region.
Dependencies are inferred from the claim text.