Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound

2:

• The radiation-sensitive resin composition according to claim 1, wherein R2 represents the monovalent organic group having 1 to 20 carbon atoms.

3:

• The radiation-sensitive resin composition according to claim 1, wherein the organic group which is represented by R2 is a monovalent hydrocarbon group having 1 to 20 carbon atoms, or a group obtained by substituting a part or all of hydrogen atoms contained in the monovalent hydrocarbon group with a monovalent heteroatom-containing group.

The radiation-sensitive resin composition according to claim 1, wherein R3 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms.

5:

• The radiation-sensitive resin composition according to claim 1, wherein R4 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms.

6:

• The radiation-sensitive resin composition according to claim 1, wherein R5 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms.

7:

• The radiation-sensitive resin composition according to claim 1, wherein the polymer further comprises a second structural unit comprising a phenolic hydroxy group.

8:

• The radiation-sensitive resin composition according to claim 1, wherein the polymer further comprises a third structural unit which is a structural unit other than the first structural unit and comprises an acid-labile group.