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US 2023/0398765 A1Published application
High-gloss pattern film for vehicle and method of manufacturing the same
AssigneeStek Co., Ltd.
InventorsInhwan Oh, Subin Park, Seunghwan Baek
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Abstract
The present invention relates to a high-gloss pattern film for a vehicle and a method of manufacturing the same, and more particularly, to a high-gloss pattern film for a vehicle, which has excellent gloss, implements various patterns and colors, and has excellent durability, and a method of manufacturing the same.
Claims7
A high-gloss pattern film for a vehicle, the high-gloss pattern film comprising:
- a self-restoration layer including polyurethane methacrylate and an isocyanate curing agent;
- a first base layer disposed under the self-restoration layer, and including a thermoplastic polyurethane film;
- a pattern layer disposed under the first base layer;
- a second base layer disposed under the pattern layer, and including a thermoplastic polyurethane film;
- and
- a third base layer disposed under the second base layer, and including an adhesive layer,
- wherein a portion of a top surface of the pattern layer is laminated to the first base layer and said top surface has a concavo-convex shape which forms empty spaces between the pattern layer and the first base layer.
4 more elements
A method of manufacturing a high-gloss pattern film for a vehicle, in which the high-gloss pattern film for the vehicle includes:
- a self-restoration layer including polyurethane methacrylate and an isocyanate curing agent;
- a first base layer disposed under the self-restoration layer, and including a thermoplastic polyurethane film;
- a pattern layer disposed under the first base layer;
- a second base layer disposed under the pattern layer, and including a thermoplastic polyurethane film;
- and a third base layer disposed under the second base layer, and including an adhesive layer,
- wherein a portion of a top surface of the pattern layer is laminated to the first base layer and said top surface has a concavo-convex shape which forms empty spaces between the pattern layer and the first base layer.
3 more elements
Dependencies are inferred from the claim text.