Method of cleaning, support, and cleaning apparatus
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYi Chen HO, Chih Ping LIAO, Ker-hsun LIAO, Chi-Hsun LIN
Life of this patent
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Abstract
A method of cleaning includes placing a semiconductor device manufacturing tool component made of quartz on a support. A cleaning fluid inlet line is attached to a first open-ended tubular quartz projection extending from an outer main surface of the semiconductor device manufacturing tool component. A cleaning fluid is applied to the semiconductor device manufacturing tool component by introducing the cleaning fluid through the cleaning fluid inlet line and the tubular quartz projection.
Claims22
A method of cleaning, comprising:
- placing a semiconductor device manufacturing tool component made of quartz on a support;
- attaching a cleaning fluid inlet line to a first open-ended tubular quartz projection extending from an outer main surface of the semiconductor device manufacturing tool component,
- wherein the first open-ended tubular quartz projection includes a ground glass ball joint at an outer end;
- and
- cleaning the semiconductor device manufacturing tool component by applying a cleaning fluid to the semiconductor device manufacturing tool component by introducing the cleaning fluid through the cleaning fluid inlet line and the first open-ended tubular quartz projection.
(canceled)
-20. (canceled)
A method of cleaning a quartz tube furnace component, comprising:
- placing the quartz tube furnace component on a support,
- wherein the support comprises an annular base and a plurality of vertically extending members arranged on the annular base, wherein each vertically extending member includes a horizontally extending shelf;
- attaching a cleaning fluid inlet line having a bottom projection adapter to a tubular projection extending from quartz tube furnace component using a pivoting screw clamp,
- wherein the bottom projection adapter mates with the tubular projection;
- and
- cleaning the quartz tube furnace component by applying a cleaning fluid to the quartz tube furnace component by introducing the cleaning fluid through the cleaning fluid inlet line and the tubular projection.
A method of cleaning a quartz tube furnace component, comprising:
- placing the quartz tube furnace component on a support structure arranged inside an enclosure,
- wherein the quartz tube furnace component has a quartz tubular projection extending from the quartz tube furnace component,
- wherein the support structure comprises:
- an annular base and three or more vertically extending members arranged on the annular base, wherein:
- each vertically extending member includes a shelf extending in a radial direction away from a center of the annular base,
- the vertically extending members are evenly arranged around the annular base,
- a ratio of a distance from a top surface of the shelf to an uppermost surface of the vertically extending member to a distance from a top surface of the annular base to the uppermost surface of the vertically extending member ranges from 0.05 to 0.5, and
- a ratio of a length of the shelf extending in the radial direction to the distance from the top surface of the annular base to the uppermost surface of the vertically extending member ranges from 0.05 to 0.8;
- attaching a cleaning fluid inlet line to the quartz tubular projection
- wherein the cleaning fluid inlet line mates with the quartz tubular projection;
- and
- cleaning the quartz tube furnace component by applying a cleaning fluid to the quartz tube furnace component by introducing the cleaning fluid through the cleaning fluid inlet line and the quartz tubular projection.
Dependencies are inferred from the claim text.