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US 2023/0390793 A1Published application
Nozzle, development device, and method for processing object being treated
AssigneeSintokogio, Ltd.
InventorsShinji KANDA, Norihito SHIBUYA
Life of this patent
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Abstract
In one aspect, a nozzle for injecting a processing liquid is provided. The nozzle includes a cylindrical housing having a central axis, a liquid supply port to supply the processing liquid into the housing, a gas supply port to supply a compressed gas into the housing, and an injection port to inject the processing liquid together with the compressed gas, and the injection port has an annular shape extending around the central axis.
Claims15
A nozzle for injecting a processing liquid, the nozzle comprising a cylindrical housing having a central axis,
- wherein the housing comprises:
- a liquid supply port to supply the processing liquid into the housing;
- a gas supply port to supply a compressed gas into the housing;
- and
- an injection port to inject the processing liquid together with the compressed gas,
- wherein the injection port has an annular shape extending around the central axis.
3 more elements
A processing method for a workpiece, comprising:
- forming a photosensitive resist film on the workpiece;
- exposing the resist film;
- and
- injecting a developer with a compressed gas from a nozzle having an annular injection port to the exposed resist film to form a resist pattern.
1 more element
Dependencies are inferred from the claim text.