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US 2023/0339065 A1Published application
Chamber components with polished internal apertures
AssigneeApplied Materials, Inc.
InventorsJennifer Y. Sun, Vahid Firouzdor, David Koonce, Biraja Prasad Kanungo
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Abstract
Disclosed herein is a plasma-resistant chamber component and a method for manufacturing the same. A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment includes a ceramic article having multiple polished apertures. A roughness of the multiple polished apertures is less than 32 µin.
Claims20
A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment, the chamber component comprising:
- a ceramic article having a plurality of polished apertures therein, wherein a roughness of the plurality of polished apertures is less than 32 µin.
Dependencies are inferred from the claim text.