US 2023/0335349 A1 · FILTERING PATTERN FOR LASER BEAMS SUITABLE FOR THE PRODUCTION OF SUPERCAPACITORS

Abstract

A method and apparatus comprising a manufacturing process, equipment and a product. The manufacturing process and equipment configured to produce very high precision parts using a laser beam. Embodiments of the manufacturing process and equipment provide an improved method for the production of supercapacitors with critical dimensions on the order of one to fifty microns that can store electricity at very high energy densities using a modified laser beam. Using the manufacturing process and equipment, the proposed improvements allow the production of key parts thousands of times faster than what can be achieved using the usual process, resulting in a manufacturing time suitable for mass production.

Claims18

Dependent claims

A filtering pattern for the collimation of a laser beam, comprising:

a glass layer;
a sealant layer comprising a pattern;
wherein the sealant layer is formed on a surface of the glass layer and the sealant layer is designed to absorb the laser beam;
wherein the pattern in the sealant layer is formed by a plurality of gaps, the gaps designed to allow the laser beam to pass through the sealant layer and produce cuts on a substrate;
and the pattern formed by the plurality of gaps is on a 1 to 1 scale to the cuts on the substrate.

2 more elements

A filtering device for the collimation of a laser beam comprising:

a plurality of filtering patterns each filtering pattern comprising a pattern formed by a plurality of gaps, the gaps designed to allow the laser beam to pass through the sealant layer and produce cuts on the substrate;
wherein the plurality of filtering patterns are placed at variable distances to each other in perfect alignment so that when seen from the point of view of the incident laser beam all filtering patterns are seen as a single filtering pattern and correspondent gaps in the filtering patterns are seen as a single gap;
wherein the filtering device is configured to reflect or absorb portions of a laser beam that enter the plurality of filtering patterns at a diversion angle non-perpendicular to the plurality of filtering patterns and at an angle greater than the angle allowed by the edges of correspondent gaps in the first and last filtering pattern and smaller than the maximum diversion angle of the laser source.

Dependencies are inferred from the claim text.

Filtering pattern for laser beams suitable for the production of supercapacitors

Life of this patent

Filtering pattern for laser beams suitable for the production of supercapacitors

Life of this patent

Abstract

Claims18