Plasma processing system and multi-section faraday shielding device thereof

A multi-section Faraday shielding device of a plasma processing system, comprising

• an electrically conductive ring and a plurality of electrically conductive petal-shaped assemblies radially and symmetrically arranged on the outer periphery of the electrically conductive ring;
• wherein each of the electrically conductive petal-shaped assemblies includes a plurality of electrically conductive plates and a plurality of connecting capacitors;
• the plurality of electrically conductive plates of each of the electrically conductive petal-shaped assemblies are arranged at intervals along a radial direction;
• a connecting capacitor is provided between every two adjacent electrically conductive plates;
• wherein each connection capacitor includes an upper electrode plate and a lower electrode plate, a lower end surface of the upper electrode plate and/or an upper end surface of the lower electrode plate are provided with an insulating coating;
• the upper electrode plate and the lower electrode plate are parallel to the electrically conductive plate;
• the lower end surface of the upper electrode plate is connected to the upper end surface of the lower electrode plate, the upper electrode plate is electrically conductively connected to one electrically conductive plate of two adjacent electrically conductive plates, and the lower electrode plate is electrically conductively connected to another electrically conductive plate of the two adjacent electrically conductive plates;
• and the plurality of electrically conductive plates are located on a same plane.