Apparatus and method for inspection
AssigneeHitachi, Ltd.
InventorsAtsushi OKU, Kazuya SUMITA, Kozue ONISHI, Akihiro MATSUMOTO, Eri KUBO, Keitaro UEHARA
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AssigneeHitachi, Ltd.
InventorsAtsushi OKU, Kazuya SUMITA, Kozue ONISHI, Akihiro MATSUMOTO, Eri KUBO, Keitaro UEHARA
Estimating the term…
An apparatus and/or method is proposed that can show evidence for judgment results in an abnormality judgment using a judgment model obtained by machine learning. Pieces of processed data with a mask corresponding to characteristics of waveform data set on a spectrogram of waveform data are created using a judgment model obtained by machine learning by sequentially shifting the mask in a direction corresponding to the mask, a change rate or a change degree of the waveform data of each piece of created processed data from the spectrogram is calculated, each area in which the mask on the spectrogram of the waveform data is set based on the calculated change rate or change degree is colored with a color or concentration corresponding to the change rate or change degree of the processed data when the mask is set so as to draw and display a judgment evidence image.
An inspection apparatus that judges the presence or absence of abnormality based on a spectrogram of waveform data, comprising:
An inspection method executed by an inspection apparatus that judges the presence or absence of abnormality based on a spectrogram of waveform data, the method comprising:
Dependencies are inferred from the claim text.