Substrate processing apparatus and monitoring method in substrate processing apparatus
AssigneeSCREEN Holdings Co., Ltd.
InventorsShinji SHIMIZU, Ryo YAMADA, Tatsuya MASUI, Yuichi DEBA, Miwa MIYAWAKI
Life of this patent
Estimating the term…
Loading patent…
AssigneeSCREEN Holdings Co., Ltd.
InventorsShinji SHIMIZU, Ryo YAMADA, Tatsuya MASUI, Yuichi DEBA, Miwa MIYAWAKI
Estimating the term…
A substrate processing apparatus collectively processes a plurality of substrates with the plurality of substrates immersing in a processing liquid. The substrate processing apparatus includes a processing tank, a camera, and a controller. The processing tank stores the processing liquid. The camera is provided vertically higher above the processing tank and captures the inside of the processing tank to generate a plurality of items of captured image data. The controller generates smoothed image data obtained by smoothing a brightness distribution of waving caused on a liquid surface of the processing liquid based on integration of the plurality of items of captured image data, and monitors the inside of the processing tank based on the smoothed image data.
A substrate processing apparatus configured to collectively process a plurality of substrates by immersing the plurality of substrates in a processing liquid, comprising:
A monitoring method in a substrate processing apparatus, comprising:
Dependencies are inferred from the claim text.