Substrate processing liquid, substrate processing method, and substrate processing apparatus

Abstract

In the present invention, a substrate processing liquid includes an auxiliary agent which is added to a solution in which a sublimable substance is dissolved in a solvent, to thereby disperse particles of the sublimable substance, the amount of which exceeds the solubility, in the solution. In the substrate processing liquid, the particles of the sublimable substance, the amount of which exceeds the solubility, are uniformly dispersed and dissolved in the solvent. Therefore, the amount of sublimable substance to be supplied onto a pattern formation surface of a substrate is larger than that in the conventional technique and a large amount of sublimable substance (solid phase) exists inside a pattern. As a result, it is possible to effectively suppress the solvent from remaining between the patterns and perform sublimation drying in a state where the patterns are firmly held by the sublimable substance (solid phase).

Dependencies are inferred from the claim text.