Ruthenium etchant composition, pattern formation method using same composition, method of manufacturing array substrate, and array substrate manufactured thereby

Abstract

Disclosed is a ruthenium etchant composition containing periodic acid and ammonium ions and having a pH of 6 to 7.5. Further disclosed are a pattern formation method including a step of etching a ruthenium metal film using the etchant composition, a method of manufacturing a display device array substrate by employing the pattern formation method, and a display device array substrate manufactured by the method.

Dependencies are inferred from the claim text.