Reducing backscattered electron induced errors
AssigneeApplied Materials Israel Ltd.
InventorLior Akerman
Life of this patent
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Abstract
A method for improving a quality of a secondary electron image of a region of a sample, the method may include obtaining a backscattered electron (BSE) image of the region and a secondary electron (SE) image of the region; wherein the BSE image and the SE image are generated by scanning of the region with an electron beam; processing the BSE image and the SE image to provide a processed BSE image and a processed SE image; and generating a BSE compensated SE image, wherein the generating comprises applying one or more selected BSE correction factors on one or more parts of the processed BSE image.
Claims17
A method for improving a quality of a secondary electron image of a region of a sample, the method comprising:
- (a) obtaining a backscattered electron (BSE) image of the region and a secondary electron (SE) image of the region, wherein the BSE image and the SE image are generated by scanning of the region with an electron beam;
- (b) processing the BSE image and the SE image to provide a processed BSE image and a processed SE image;
- (c) generating a BSE compensated SE image, wherein the generating comprises applying one or more selected BSE correction factors on one or more parts of the processed BSE image.
A non-transitory computer readable medium that stores computer-readable instructions for improving a quality of a secondary electron image of a region of a sample by:
- (a) obtaining a backscattered electron (BSE) image of the region and a secondary electron (SE) image of the region;
- wherein the BSE image and the SE image are generated by scanning of the region with an electron beam;
- (b) processing the BSE image and the SE image to provide a processed BSE image and a processed SE image;
- and
- (c) generating a BSE compensated SE image, wherein the generating comprises applying one or more selected BSE correction factors on one or more parts of the processed BSE image.
A system for improving a quality of a secondary electron image of a region of a sample, the system comprising a processing circuit that is configured to cause the system to:
- (a) obtain a backscattered electron (BSE) image of the region and a secondary electron (SE) image of the region;
- wherein the BSE image and the SE image are generated by scanning of the region with an electron beam;
- (b) process the BSE image and the SE image to provide a processed BSE image and a processed SE image;
- and
- (c) generate a BSE compensated SE image, wherein the generating comprises applying one or more selected BSE correction factors on one or more parts of the processed BSE image.
Dependencies are inferred from the claim text.