Anisotropic Pattern Transfer Via Colloidal Lithography

Abstract

A patterning method, comprising: disposing a nanoparticle composition on a support material, the disposing being performed such that the nanoparticle composition defines a patterned region having an average inter-nanoparticle distance of less than about 5 nm; and selectively etching the support material so as to give rise to in the support material a plurality of arrayed structures substantially in register with the patterned region of the nanoparticle composition. An article, comprising an article made according to the present disclosure. A workpiece, comprising: an etchable support material; and a nanoparticle composition, the nanoparticle composition being disposed on the support material as a monolayer, the nanoparticle composition defining a patterned region having an average inter-nanoparticle distance of less than about 5 nm, and nanoparticles of the nanoparticle composition having ligands disposed thereon. An article, comprising: a substrate, the substrate having formed therein a plurality of structures arranged arrayed periodically, the structures defining an average inter-structure spacing of less than about 5 nm.

Dependencies are inferred from the claim text.