Device Having Cleaning Bodies
AssigneeTung An Development Ltd.
InventorsChih-An Ku, Tzu-Yen Chuang, Hung-Chieh Chao, Fu-Qiang Zhang, Ming-Chin Tsai
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AssigneeTung An Development Ltd.
InventorsChih-An Ku, Tzu-Yen Chuang, Hung-Chieh Chao, Fu-Qiang Zhang, Ming-Chin Tsai
Estimating the term…
A cleaning device comprises a carrier and a cleaning unit. On the surface of the carrier, the cleaning unit comprises cleaning bodies of trapezoidal cylinders with a first surface and two inclined planes. The first surface is parallel to the surface of the carrier. The inclined planes face the circumference of the carrier and are separately located between adjacent two of the cleaning bodies. The first surface has a distance of 6.5 mm±10% to the surface of the carrier. The inclined planes at two sides have an angle of 50°±10% in between. When the cleaning body starts contacting a wafer, one of the inclined planes is deformed as a beginning. Then, gentle area changes is formed from contacting until departing between the cleaning body and the wafer. The wafer is thus stably forced to improve cleaning ability of scrubbing and stabilize surface friction of the wafer.
A cleaning device, comprising
Dependencies are inferred from the claim text.