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US 2023/0178326 A1Published application
Charged particle beam generation
AssigneeMicrochip Technology Incorporated
InventorsHyunwook Park, Nakri Dao, Kim Richard Overstreet
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Abstract
One or more examples relate, generally, to an apparatus. The apparatus includes a charged particle source and a charged particle pointer. The charged particle pointer urges charged particles emitted by the charged particle source in a predetermined direction. The charged particle pointer comprises a repeller, and an isolator positioned along a path extending from the repeller in the predetermined direction.
Claims13
An apparatus, comprising:
- a charged particle source;
- and
- a charged particle pointer to collimate and urge charged particles emitted by the charged particle source toward a predetermined direction, the charged particle pointer comprising:
- a repeller;
- and
- an isolator positioned along a path extending from the repeller in the predetermined direction.
3 more elements
A method, comprising:
- setting an energy amount for a charged particle beam;
- determining a voltage potential of a repeller at least partially responsive to the set energy amount;
- setting a voltage to apply to the repeller at least partially responsive to the determined voltage potential;
- determining a charged particle emission rate of a charged particle source at least partially responsive to the set energy amount;
- determining a temperature of a filament of the charged particle source at least partially responsive to the determined charged particle emission rate;
- determining a magnitude of current to flow through the filament at least partially responsive to the determined temperature;
- and
- setting a current to apply to the filament of the charged particle source at least partially responsive to the determined magnitude of current.
5 more elements
An apparatus, comprising:
- at least one processor;
- and
- at least one storage device to store instructions to adapt the at least one processor to:
- set an energy amount for a charged particle beam;
- determine a voltage potential of a repeller at least partially responsive to the set energy amount;
- setting a voltage to apply to the repeller at least partially responsive to the determined voltage potential;
- determine a charged particle emission rate of a charged particle source at least partially responsive to the set energy amount;
- determine a temperature of a filament of the charged particle source at least partially responsive to the determined charged particle emission rate;
- determine a magnitude of current to flow through the filament at least partially responsive to the determined temperature;
- and
- set a current to apply to the filament of the charged particle source at least partially responsive to the determined magnitude of current.
8 more elements
Dependencies are inferred from the claim text.