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US 2023/0178258 A1Published application
Systems and methods for improved sustainment of a high performance frc with multi-scaled capture type vacuum pumping
AssigneeTae Technologies, Inc.
InventorAlan Van Drie
Life of this patent
Estimating the term…
Abstract
Systems and methods that facilitate forming and maintaining FRCs with superior stability as well as particle, energy and flux confinement and, more particularly, systems and methods that facilitate forming and maintaining FRCs with elevated system energies and improved sustainment utilizing multi-scaled capture type vacuum pumping.
Claims10
A capture vacuum pump comprising
- an open sided chamber comprising
- two or more plates with surfaces having a view of each other, the two or more plates comprising one or more side plates coupled to the end plate at a first end of the one or more side plates and extending to an opening defined by a second end of the one or more side plates, the opening defining an area equivalent to the surface of the end plate with the length of the one or more side plates defining a depth (D) of the capture vacuum pump and the two or more plates with surfaces having a view of the opening,
- a film of titanium deposited on the surfaces of the plates, wherein the film deposited surfaces having a sticking factor corresponding to the probability of an individual gas molecule sticking to the film deposited surface due to a single hit of the individual gas molecule to the film deposited surface when the film deposited surfaces are exposed to the gas, wherein the capture vacuum pump has a sticking factor greater than a sticking factor of the film deposited surface of the end plate on its own.
Dependencies are inferred from the claim text.