Image sensor, method of manufacturing image sensor, and electronic device including image sensor

A method of manufacturing an image sensor, the method comprising:

• forming a spacer layer on a sensor substrate, the sensor substrate comprising a plurality of light sensing cells;
• forming a first dielectric layer on the spacer layer;
• forming a first chemical mechanical polishing (CMP) stop layer on the first dielectric layer;
• forming a first engraved pattern by patterning an opening in the first dielectric layer and the first CMP stop layer;
• forming a first nanopattern layer by filling the first engraved pattern with a first dielectric material having a first refractive index different from a second refractive index of the first dielectric layer, wherein the first dielectric material extends onto an upper surface of the first CMP stop layer;
• and
• forming a first lens layer by removing a portion of the first nanopattern layer formed on the upper surface of the first CMP stop layer.