Molybdenum precursor compounds
AssigneeEntegris, Inc.
InventorsBenjamin R. Garrett, Michael Watson, Pei Zhao
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Abstract
The invention provides certain molybdenum-containing compounds which are believed to be useful in the vapor deposition of molybdenum-containing films onto the surface of various microelectronic device substrates. In one aspect, the invention provides a process for depositing a molybdenum-containing film onto a microelectronic device substrate, which comprises exposing the substrate, in a reaction zone, to a compound of Formula (I) as described herein, under vapor deposition conditions.
Claims13
A process for depositing a molybdenum-containing film onto a microelectronic device substrate, which comprises exposing the substrate, in a reaction zone, to a compound of Formula (I):
- wherein each R is independently chosen from (i) C1-C4 alkyl or (ii) C1-C4 alkyl substituted by one or more halogen atoms;
- under vapor deposition conditions, thereby forming a molybdenum-containing film on the substrate.
Dependencies are inferred from the claim text.