Composition and method for conducting a material removing operation
AssigneeSaint-Gobain Ceramics & Plastics, Inc.
InventorsLin FU, Jason A. SHERLOCK, Long Huy BUI, Douglas E. WARD
Life of this patent
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Abstract
A composition suitable for chemical mechanical polishing a substrate can comprise abrasive particles, a multi-valent metal borate, at least one oxidizer and a solvent. The composition can polish a substrate with a high material removal rate and a very smooth surface finish.
Claims20
A kit adapted for preparing a composition for polishing a substrate, the kit comprising a first package and a second package, wherein the first package comprises a multi-valent metal salt, and the second package comprises boric acid.
A kit comprising a first package and a second package, wherein the kit is adapted that after combining the first package and the second package a composition is obtained, the composition comprising abrasive particles, a multi-valent metal borate, at least one oxidizing agent and a solvent.
Dependencies are inferred from the claim text.