Substrate processing apparatus and the method thereof

An apparatus for processing substrates, the apparatus comprising:

• a head including a plurality of nozzles and configured to form on the substrate a plurality of ink patterns spaced apart from each other by jetting ink onto the substrate through the plurality of nozzles;
• a first imaging module configured to perform generating a plurality of ink pattern images by imaging the plurality of ink patterns;
• and
• a control module configured to perform calculating respective grayscale values of the plurality of ink pattern images, and to select at least one nozzle for jetting ink into one pixel area based on calculated grayscale values.

An apparatus for processing one or more substrates, comprising:

• a first stage;
• a second stage that is adjacent to the first stage;
• a gantry disposed to cross the first stage and the second stage;
• an inkjet head module installed on the gantry, including a plurality of nozzles, and configured to jet ink in the first stage and the second stage;
• a first imaging module installed on the gantry;
• and
• a control module configured to control the inkjet head module and the first imaging module,
• wherein the inkjet head module is configured to form a plurality of ink patterns by jetting ink onto one or more test substrates in the second stage,
• the first imaging module is configured to perform generating ink pattern images by imaging the ink patterns, and
• the control module is configured to perform calculating respective densities of the ink patterns from the ink pattern images.