Improved lithography apparatus
AssigneeASML Netherlands B.V.
InventorsPaulus Albertus VAN HAL, Adrianus Hendrik KOEVOETS, Beatriz SEOANE DE LA CUESTA
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Abstract
A substrate with a backside surface configured to provide a friction switch when the substrate is loaded onto a substrate holder in a substrate-loading cycle, wherein the substrate backside surface has a molecular assembly including at least one high-interaction region and at least one low-interaction region. Further, there is provided methods using such a substrate and methods for creating such a substrate.
Claims20
A substrate with a backside surface configured to provide a friction switch when the substrate is loaded onto a substrate holder in a substrate-loading cycle, wherein the substrate backside surface comprises a molecular assembly comprising at least one high-interaction region and at least one low-interaction region.
A method of coating a backside surface of a substrate with a friction-switch coating, the method comprising:
- applying a molecular species comprising at least one low-interaction region to a first portion of the backside surface of the substrate, and
- applying a molecular species comprising at least one high-interaction region to a second portion of the backside surface of the substrate.
A method of coating a backside surface of a substrate with a friction-switch coating, the method comprising:
- applying a molecular species comprising at least one low-interaction region to a first portion of the backside surface of the substrate, and
- applying gas molecules comprising at least one high-interaction region to a second portion of the backside surface of the substrate, wherein at least a portion of the gas molecules adsorb onto the substrate backside surface.
A method of providing a friction-switch during loading of a substrate onto a substrate holder, the method comprising:
- applying a first molecular species comprising at least one low-interaction region to a first portion of the backside surface of the substrate;
- applying a second molecular species to a second portion of the backside surface of the substrate;
- and
- loading the substrate onto the substrate holders
- wherein the second molecular species reacts during loading of the substrate to form a high-interaction region.
Dependencies are inferred from the claim text.