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US 2023/0067579 A1Published application
Substrate processing apparatus and method
AssigneePicosun Oy
InventorVäinö KILPI
Life of this patent
Estimating the term…
Abstract
A substrate processing apparatus includes an inner chamber formed by an upper portion and a lower portion, a substrate support to support a substrate within the upper portion of the inner chamber, a plasma system to provide the inner chamber with plasma species from the top side of the inner chamber, and an outer chamber surrounding the upper portion of the inner chamber. The lower portion of the inner chamber extends to the outside of the outer chamber and remains uncovered by the outer chamber.
Claims16
1-17. (canceled)
A substrate processing apparatus, comprising:
- an inner chamber;
- an outer chamber at least partly surrounding the inner chamber;
- a substrate support to support a substrate in the inner chamber;
- a lid;
- and
- a plasma generator integrated with the lid.
3 more elements
20-34. (canceled)
Dependencies are inferred from the claim text.