Vapor chamber structure
AssigneeUnimicron Technology Corp.
InventorsRa-Min Tain, John Hon-Shing Lau, Pu-Ju Lin, Wei-Ci Ye, Chi-Hai Kuo, Cheng-Ta Ko, Tzyy-Jang Tseng
Life of this patent
Estimating the term…
Loading patent…
AssigneeUnimicron Technology Corp.
InventorsRa-Min Tain, John Hon-Shing Lau, Pu-Ju Lin, Wei-Ci Ye, Chi-Hai Kuo, Cheng-Ta Ko, Tzyy-Jang Tseng
Estimating the term…
A vapor chamber structure includes a thermally conductive shell, a capillary structure layer, and a working fluid. The thermally conductive shell includes a first thermally conductive portion and a second thermally conductive portion. The first thermally conductive portion and the second thermally conductive portion are a thermally conductive plate that is integrally formed, and the thermally conductive shell is formed by folding the thermally conductive plate in half and then sealing the thermally conductive plate. The first thermally conductive portion has at least one first cavity, the second thermally conductive portion has at least one second cavity. At least one sealed chamber is defined between the thermally conductive plate, the first cavity and the second cavity. A pressure in the sealed chamber is lower than a standard atmospheric pressure. The capillary structure layer covers an inner wall of the sealed chamber. The working fluid is filled in the sealed chamber.
A vapor chamber structure, comprising:
Dependencies are inferred from the claim text.