US 2023/0067094 A1 · SUBSTRATE PROCESSING APPARATUS

Abstract

A substrate processing apparatus including: a processing container; a stage installed in the processing container and configured to place a substrate thereon; a ceiling plate installed at a position facing the stage in the processing container; a driver configured to raise and lower the stage; an exhaust port formed in a side wall of the processing container and configured to exhaust a gas in the processing container; and a controller configured to control conductance of a space between the exhaust port and a processing space between the stage and the ceiling plate by controlling the driver to adjust a distance between a peripheral edge portion of the stage and a facing member disposed at a position facing the peripheral edge portion in the processing container.

Claims16

Dependent claims

A substrate processing apparatus comprising:

a processing container;
a stage installed in the processing container and configured to place a substrate thereon;
a ceiling plate installed at a position facing the stage in the processing container;
a driver configured to raise and lower the stage;
an exhaust port formed in a side wall of the processing container and configured to exhaust a gas in the processing container;
and
a controller configured to control conductance of a space between the exhaust port and a processing space between the stage and the ceiling plate by controlling the driver to adjust a distance between a peripheral edge portion of the stage and a facing member disposed at a position facing the peripheral edge portion in the processing container.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application

17/820,637Filed 18 Aug 2022

Priority

JP 2021-14046330 Aug 2021

Published

2 Mar 2023

Term ends

Not estimatedThe source records don’t support an estimate.

Classification14 codes

C23C 16/4585
The substrate being supported substantially horizontally: devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds
B05D 1/60
Processes for applying liquids or other fluent materials: deposition of organic layers from vapour phase
C23C 16/4412
Characterised by the method of coating: details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
C23C 16/4586
The substrate being supported substantially horizontally: elements in the interior of the support, e.g. electrodes, heating or cooling devices

Substrate processing apparatus

Life of this patent

Substrate processing apparatus

Life of this patent

Abstract

Claims16