Voltage pulse time-domain multiplexing
AssigneeApplied Materials, Inc.
InventorsKartik RAMASWAMY, Yang YANG, Yue GUO
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AssigneeApplied Materials, Inc.
InventorsKartik RAMASWAMY, Yang YANG, Yue GUO
Estimating the term…
Embodiments provided herein generally include apparatus, plasma processing systems and methods for generation of a waveform for plasma processing of a substrate in a processing chamber. One embodiment includes a waveform generator having a voltage source circuitry, a first switch coupled between the voltage source circuitry and a first output node of the waveform generator, the first output node being configured to be coupled to a chamber, and a second switch coupled between the first output node and electrical ground node. The waveform generator also includes a third switch coupled between the voltage source circuitry and a second output node of the waveform generator, the second output node being configured to be coupled to the chamber, and a fourth switch coupled between the second output node and the electrical ground node.
A plasma processing system comprising:
An apparatus for generating a plasma, comprising:
A plasma processing system comprising:
Dependencies are inferred from the claim text.