Quartz susceptor for accurate non-contact temperature measurement
AssigneeApplied Materials, Inc.
InventorKim Ramkumar Vellore
Life of this patent
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Abstract
The present disclosure generally relates to a substrate support for processing of semiconductor substrates. In one example, the substrate support has a body. The body has a top surface configured to support a substrate thereon. The body has a bottom surface opposite the top surface. The body has an upper portion disposed at the top surface and a lower portion disposed at the bottom surface. An IR blocking material is encased by the upper portion and the lower portion, wherein the IR blocking material is an optically opaque at IR wavelengths and the lower portion is optically transparent at IR wavelengths.
Claims20
A substrate support comprising:
- a body comprising:
- a top surface configured to support a substrate thereon;
- a bottom surface opposite the top surface;
- an upper portion disposed at the top surface;
- a lower portion disposed at the bottom surface;
- and
- an IR blocking material encased by the upper portion and the lower portion, wherein the IR blocking material is an optically opaque at IR wavelengths and the lower portion is optically transparent at IR wavelengths.
A processing chamber comprising:
- a chamber body assembly;
- a lower window;
- an upper window, wherein the lower window and the upper window are on opposite sides of an internal chamber volume;
- a plurality of temperature control elements configured to heat a substrate disposed in the internal volume;
- a susceptor assembly disposed in the internal volume;
- and
- a lower pyrometer disposed outside the internal chamber volume and configured detect a first temperature of the susceptor assembly through the lower window;
- and
- an upper pyrometer disposed outside the internal chamber volume and configured to detect a second temperature of the susceptor assembly through the upper window, wherein the susceptor assembly comprises:
- a shaft;
- a substrate support disposed on the shaft, the substrate support comprising:
- a body having a top surface configured to support a substrate thereon, the body comprising:
- an IR transparent material;
- and
- an IR blocking material encased in the body and having the IR transparent material disposed below the IR blocking material, wherein the IR blocking material is an optically opaque at IR wavelengths.
A method for detect a temperature of a substrate support, the method comprising:
- rotating a substrate disposed on a substrate support, the substrate support disposed within a processing chamber;
- and
- scanning an IR blocking material disposed in the rotating substrate support disposed within a processing chamber with a pyrometer disposed outside the processing chamber, wherein the IR blocking material is disposed in an IR transmissive material of the substrate support.
Dependencies are inferred from the claim text.