Semiconductor apparatus for deposition process

An apparatus for performing a deposition process on a semiconductor wafer, comprising:

• a chamber comprising a reaction area above the semiconductor wafer;
• and
• a shielding structure disposed in the chamber and isolating an inner sidewall of the chamber from the reaction area, the shielding structure comprising:
• a base member comprising a sidewall with a first window, the sidewall of the base member disposed around the inner sidewall of the chamber;
• an inner ring disposed on the base member and comprising a sidewall with a second window, the first window of the base member being in communication with the second window of the inner ring to transfer the semiconductor wafer;
• and
• an outer ring disposed on the base member and disposed between the inner sidewall of the chamber and the inner ring, the outer ring comprising a closed sidewall that is free of window.

An apparatus for performing a deposition process on a semiconductor wafer, comprising:

• a chamber comprising a reaction area above the semiconductor wafer;
• a wafer holder disposed in the chamber and comprising a carrying surface on which the semiconductor wafer is disposed;
• and
• a shielding structure disposed in the chamber and disposed between an inner sidewall of the chamber and the wafer holder, the shielding structure comprising:
• an inner ring comprising a first window and defining a first inner space and a first outer space, and the first window communicating the first outer space with the first inner space in a radial direction of the inner ring;
• and
• an outer ring disposed between the inner sidewall of the chamber and the inner ring, the outer ring defining a second inner space and a second outer space, and the outer ring comprising a closed sidewall which blocks the second inner space from the second outer space in a radial direction of the outer ring.