Plasma processing apparatus

A plasma processing apparatus, comprising:

• a processing chamber in which a sample is subjected to plasma processing;
• a first radio frequency power supply that supplies radio frequency power for generating plasma;
• a sample stage on which the sample is mounted;
• and
• a second radio frequency power supply that supplies radio frequency power to the sample stage, wherein
• the plasma processing apparatus further comprises a DC power supply that applies a DC voltage, that is changed according to periodically repeated waveform, to the sample stage,
• the waveform of one cycle has a period in which amplitude changes by a predetermined amount or more during a predetermined time,
• a ratio of a time during which the DC voltage rises to a time during which the DC voltage falls is a value obtained by dividing a predetermined value by a value obtained by subtracting the predetermined value from 1, and
• the predetermined value is a value obtained by dividing mobility of ions by a sum of mobility of electrons in a dielectric on the sample and the mobility of the ions in the dielectric.