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US 2023/0057529 A1Published application
Process for forming a coating
AssigneeHenkel AG & Co. KGaA
InventorsMiguel GALVEZ, Bong June ZHANG
Life of this patent
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Abstract
A process for forming a coating on a substrate including atomizing a formulation and applying the formulation to a substrate to form a coating on a substrate.
Claims36
A process for forming a coating on a substrate, the process comprising,
- (a) providing a substrate having a substrate surface;
- (b) providing a formulation comprising a halogenated alkyl silane and a solvent;
- (c) atomizing the formulation with a nozzle at an atomization pressure of about 20 kPa to about 2,000 kPa and at a flow rate of about 1 ml/min to about 50 ml/min to form an atomized formulation;
- and
- (d) applying the atomized formulation to the substrate surface at a distance of about 1 cm to about 50 cm from the nozzle,
- wherein the coating has a water contact angle less than about 100°.
3 more elements
A process for forming a coated substrate, the process comprising
- atomizing a formulation through a tip of a nozzle at a pressure of at least 100 kPa to form an atomized formulation, and
- coating a surface of a substrate with the atomized formulation,
- wherein the distance from the tip of the nozzle to the surface of the substrate is at least 1 cm;
- and
- wherein the coated substrate has a water contact angle less than 100°.
2 more elements
Dependencies are inferred from the claim text.