Wafer cleaning device and wafer cleaning system

A wafer cleaning system, comprising:

• a bearing platform, configured to bear a wafer;
• and
• a wafer cleaning device;
• wherein the wafer cleaning device comprises a liquid inlet pipe, a first liquid discharge pipe, a first valve and a liquid supply device;
• the liquid inlet pipe has an inlet terminal and an outlet terminal, the outlet terminal is arranged facing a wafer to be cleaned, a wall of the liquid inlet pipe is protruded outward to form a protrusion, the protrusion has a cavity communicated with inside of the liquid inlet pipe;
• one terminal of the first liquid discharge pipe is communicated with the cavity and the other terminal of the first liquid discharge pipe is communicated with a container;
• the first valve is arranged on the liquid inlet pipe and located between the protrusion and the outlet terminal;
• the liquid supply device is communicated with the inlet terminal to import cleaning solution into the liquid inlet pipe;
• and
• the outlet terminal is arranged facing the bearing platform.