US 2023/0056641 A1 · DEPOSITION COMPOSITIONS AND METHODS OF MAKING AND USING SAME

Abstract

A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf—S—Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms. The deposition composition further includes a coating material that is soluble or dispersible in said solvent.

Claims16

Dependent claims

A deposition composition comprising:

a solvent comprising a hydroflourothioether represented by the following structural formula (I):
where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms;
and a coating material that is soluble or dispersible in said solvent.

Dependencies are inferred from the claim text.

Facts

Application

17/795,387Filed 21 Jan 2021

Priority

29 Jan 2020

Published

23 Feb 2023

Term ends

Not estimatedThe source records don’t support an estimate.

Classification16 codes

C09D 5/00
Coating compositions
C08K 5/372
Thiols: sulfides , e.g. R-x-R'
C10M 107/38
Lubricating compositions characterised by the base-material being a macromolecular compound: containing halogen
C10M 135/08
Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing sulfur, selenium or tellurium:…

Deposition compositions and methods of making and using same

Life of this patent

Deposition compositions and methods of making and using same

Life of this patent

Abstract

Claims16