Charged particle assessment tool, inspection method
AssigneeASML Netherlands B.V.
InventorMarco Jan-Jaco WIELAND
Life of this patent
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Abstract
A charged particle assessment tool including: an objective lens configured to project a plurality of charged particle beams onto a sample, the objective lens having a sample-facing surface defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample; and a plurality of capture electrodes, each capture electrode adjacent a respective one of the beam apertures, configured to capture charged particles emitted from the sample.
Claims20
A charged particle assessment tool comprising:
- an objective lens array configured to project a plurality of charged particle beams onto a sample, the objective lens array defining a plurality of beam apertures through which respective ones of the charged particle beams can propagate toward the sample;
- and
- a plurality of sensor units, each sensor unit substantially surrounding a respective one of the beam apertures, configured to capture charged particles emitted from the sample.
An inspection method comprising:
- emitting a plurality of charged-particle beams through a plurality of beam apertures of an objective lens array to a sample;
- and
- capturing charged particles emitted by the sample, in response to the charged-particle beams, using a plurality of sensor units, each sensor unit surrounding a respective one of the beam apertures and each sensor unit having a circular perimeter and an area extending between the respective aperture of the sensor unit and the perimeter of the sensor unit.
The inspection method according to claim 16, further comprising generating detection signals by the sensor units, and further comprising processing the detection signals by circuitry within a substrate that comprises the sensor units.
A charged particle assessment tool comprising:
- an objective lens array configured to project a plurality of charged particle beams onto a sample, the objective lens array defining a plurality of beam apertures through which respective ones of the charged particle beams can propagate toward the sample and the objective lens array being an electrostatic array objective lens;
- and
- a plurality of sensor units, each sensor unit substantially surrounding a respective one of the beam apertures, configured to capture charged particles emitted from the sample.
Dependencies are inferred from the claim text.