Apparatus for Plasma Processing
AssigneeTokyo Electron Limited
InventorsBarton Lane, Yohei Yamazawa, Jason Mehigan, Merritt Funk
Life of this patent
Estimating the term…
Abstract
According to an embodiment, an apparatus for a plasma processing system is provided. The apparatus includes an interface, a radiating structure, and conductive offsets. The interface includes a first conductive plate couplable to an RF source, a second conductive plate disposed between the RF source and the first conductive plate, and conductive concentric ring structures disposed between the second conductive plate and a substrate holder. The conductive offsets are arranged to couple the conductive concentric ring structures to the radiating structure.
Claims20
An apparatus for a plasma processing system, the apparatus comprising:
- an interface comprising:
- a first conductive plate couplable to an RF source,
- a second conductive plate disposed between the RF source and the first conductive plate, and
- conductive concentric ring structures disposed between the second conductive plate and a substrate holder,
- a radiating structure;
- and
- conductive offsets arranged to couple the conductive concentric ring structures to the radiating structure.
An apparatus for a plasma processing system, the apparatus comprising:
- an interface comprising:
- a first conductive structure couplable to an RF source,
- a second conductive structure disposed between the RF source and the first conductive structure, each concentric conductive structure isolated from the second conductive structure by an air gap, and
- concentric conductive structures;
- and
- a radiating structure coupled to the interface.
An antenna system for exciting plasma by inductive coupling, the antenna system comprising:
- a plate;
- a conductive ring structure arranged in parallel to the plate, the plate and the conductive ring structure forming a first capacitor, the capacitance value of the first capacitor being substantially the same along one conductive ring structure;
- conductive offsets, each conductive offset having a first end and a second end, a first end of each conductive offset coupled to the conductive ring structure in a perpendicular arrangement, each conductive offset arranged equal distance from other conductive offsets along the conductive ring structure;
- and
- a plurality of spiral arms coupled to a corresponding second end of each conductive offset, each spiral arm arranged in a radial, azimuthal, and nested arrangement, each spiral arm having the same shape, length, and spacing, the plurality of spiral arms, conductive offsets, and the conductive ring structure forming a resonant structure that resonates at an RF frequency.
Dependencies are inferred from the claim text.