Method for removing a particle from a mask system
AssigneesCarl Zeiss SMT GmbH, Carl Zeiss SMS GmbH
InventorsSergey Oshemkov, Shao-Chi Wei, Joerg Frederik Blumrich, Martin Voelcker, Thomas Franz Karl Scheruebl
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Abstract
The invention relates to a method for removing particles from a mask system for a projection exposure apparatus, comprising the following method steps: detecting the particle in the mask system, providing laser radiation, removing the particle by irradiating the particle with laser radiation. According to the invention, the wavelength of the laser radiation corresponds to that of used radiation used by the projection exposure apparatus.
Claims20
A method for removing particles from a mask system for a projection exposure apparatus, comprising the following method steps:
- detecting the particle in the mask system,
- providing laser radiation, and
- removing the particle by irradiating the particle with laser radiation,
- wherein the wavelength of the laser radiation corresponds to that of used radiation used by the projection exposure apparatus.
Dependencies are inferred from the claim text.