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US 2023/0053438 A1Published application
Systems and methods to clean a continuous substrate
AssigneeIllinois Tool Works Inc.
InventorGregory T. Hall
Life of this patent
Estimating the term…
Abstract
An example method to clean a continuous substrate involves applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate; an agitator, comprising at least one of a megasonic transducer or an ultrasonic transducer, and configured to direct energy at the continuous substrate; and drying the continuous substrate.
Claims20
A system to clean a continuous substrate, the system comprising:
- one or more high pressure nozzles configured to spray a high pressure, low flow spray of a first cleaning fluid at the continuous substrate to remove particulate matter from the continuous substrate;
- an agitator, comprising at least one of a megasonic transducer or an ultrasonic transducer, and configured to direct energy at the continuous substrate;
- and
- a dryer configured to dry the continuous substrate.
1 more element
Dependencies are inferred from the claim text.