US 2023/0024422 A1 · RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

Abstract

A resist topcoat composition includes an acrylic polymer including a structural unit containing a hydroxy group and a fluorine; a mixture including a sulfonic acid compound containing at least one fluorine and a carboxylic acid compound containing at least one fluorine in a weight ratio of about 1:0.1 to about 1:50; and a solvent. A method of forming patterns uses the resist topcoat composition to form a topcoat over a patterned substrate.

Claims14

Dependent claims

A resist topcoat composition, the composition comprising:

an acrylic polymer comprising a structural unit comprising a hydroxy group and a fluorine;
a mixture comprising:
a sulfonic acid compound comprising at least one fluorine;
and
a carboxylic acid compound comprising at least one fluorine, the sulfonic acid compound and the carboxylic acid compound being in a weight ratio of about 1:0.1 to about 1:50;
and
a solvent.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application

17/746,811Filed 17 May 2022

Priority

KR 10-2021-00865301 Jul 2021

Published

26 Jan 2023

Term ends

Not estimatedThe source records don’t support an estimate.

Classification14 codes

C09D 133/08
Of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical: homopolymers or…
C07C 53/18
Halogenated acetic acids: containing fluorine
C07C 53/21
Acids containing three or more carbon atoms: containing fluorine
C07C 53/23
Containing halogen: containing rings

Resist topcoat composition, and method of forming patterns using the composition

Life of this patent

Resist topcoat composition, and method of forming patterns using the composition

Life of this patent

Abstract

Claims14