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US 2022/0290814 A1Published application
Processing apparatus and gas supply method
AssigneeTokyo Electron Limited
InventorSeiya NASU
Life of this patent
Estimating the term…
Abstract
A processing apparatus includes: a processing container configured to accommodate a substrate; a storage tank connected to the processing container via a gas supply pipe; a pressure sensor configured to detect a pressure in the storage tank; a valve provided in the gas supply pipe between the processing container and the storage tank; and a controller configured to control an opening degree of the valve based on the pressure in the storage tank detected by the pressure sensor.
Claims9
A processing apparatus comprising:
- a processing container configured to accommodate a substrate;
- a storage tank connected to the processing container via a gas supply pipe;
- a pressure sensor configured to detect a pressure in the storage tank;
- a valve provided in the gas supply pipe between the processing container and the storage tank;
- and
- a controller configured to control an opening degree of the valve based on the pressure in the storage tank detected by the pressure sensor.
3 more elements
A gas supply method comprising:
- storing a gas in a storage tank connected to a processing container via a gas supply pipe;
- and
- supplying the gas stored in the storage tank into the processing container,
- wherein a valve is provided in the gas supply pipe between the processing container and the storage tank, and
- in the supplying, the opening degree of the valve is controlled based on a pressure in the storage tank.
2 more elements
Dependencies are inferred from the claim text.