Memory device
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYen-Lin Huang, Ming-Yuan Song, Chien-Min Lee, Shy-Jay Lin
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYen-Lin Huang, Ming-Yuan Song, Chien-Min Lee, Shy-Jay Lin
Estimating the term…
A memory device is provided. The memory device includes a substrate, a spin-orbit torque layer and a magnetic tunneling junction (MTJ). The MTJ stacks with the spin-orbit torque layer over the substrate and includes a synthetic free layer, a barrier layer and a reference layer. The synthetic free layer includes a synthetic antiferromagnetic structure, a first spacer layer and a free layer, wherein the synthetic antiferromagnetic structure is disposed between the spin-orbit torque layer and the free layer. The barrier layer is disposed beside the synthetic free layer. The reference layer is disposed beside the barrier layer.
A memory device, comprising:
A memory device, comprising:
A memory device, comprising:
Dependencies are inferred from the claim text.