Vertical contacts for semiconductor devices
AssigneeMicron Technology, Inc.
InventorsByung Yoon Kim, Sangmin Hwang, Kyuseok Lee
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AssigneeMicron Technology, Inc.
InventorsByung Yoon Kim, Sangmin Hwang, Kyuseok Lee
Estimating the term…
Embodiments herein relate to vertical contacts for semiconductor devices. For instance, a memory device having vertical contacts can comprise a substrate including circuitry components, a vertical stack of layers formed from repeating iterations of a group of layers disposed on the substrate, the group of layers comprising a first dielectric material layer, a semiconductor material layer, and a second dielectric material layer including horizontal conductive lines formed along a horizontal plane in the second dielectric material layer, and vertical contacts coupled to the horizontal conductive lines, the vertical contacts extending along a vertical plane within the vertical stack of layers to directly electrically couple the horizontal conductive lines to the circuitry components.
A memory device having arrays of vertically stacked memory cells with vertical contacts, the memory device comprising:
A method for forming arrays of vertically stacked memory cells, having vertical contacts, comprising:
A memory device comprising:
Dependencies are inferred from the claim text.