Controlling concentration profiles for deposited films using machine learning

A system comprising:

• a memory;
• and
• a processing device coupled to the memory, wherein the processing device is to perform operations for training a machine learning model to predict one or more deposition settings for a deposition process to be performed for a current substrate at a manufacturing system, the operations comprising:
• generating first training data for the machine learning model, wherein the first training data comprises historical data associated with one or more prior deposition settings for a prior deposition process previously performed for a prior substrate at the manufacturing system, wherein the prior deposition process comprises depositing a prior film on a surface of a prior substrate;
• generating second training data for the machine learning model, wherein the second training data is associated with a historical concentration profile for the prior film deposited on the surface of the prior substrate;
• and
• providing the first training data and the second training data to train the machine learning model to predict, for the deposition process to be performed for the current substrate, which set of deposition settings for the deposition process corresponds to a target concentration profile for a film to be deposited on a surface of a current substrate.

A non-transitory computer readable storage medium comprising instructions that, when executed by a processing device, cause the processing device to:

• provide, as input to a trained machine learning model, data associated with a target concentration profile for a film to be deposited on a surface of a substrate during a deposition process for the substrate at a process chamber of a manufacturing system;
• obtain one or more outputs of the trained machine learning model;
• determine, from the one or more outputs, process recipe data identifying one or more sets of deposition process settings and, for each set of deposition process settings, an indication of a level of confidence that a respective set of deposition process settings corresponds to the target concentration profile for the film to be deposited on the substrate;
• and
• responsive to identifying the respective set of deposition process settings with a level of confidence that satisfies a level of confidence criterion, perform one or more operations of the deposition process in accordance with the respective set of deposition process settings.