Substrate processing apparatus and abnormality detection method
AssigneeTokyo Electron Limited
InventorsHiroaki CHIHAYA, Tetsuya MIYASHITA, Einstein Noel ABARRA, Yasuhiko KOJIMA
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Abstract
A substrate processing apparatus includes: a stage having an electrostatic chuck configured to attract a substrate; a measurement part configured to measure a temperature of the stage; and a detection part configured to detect an abnormality caused by attraction of the substrate by the electrostatic chuck, based on a fluctuation of the temperature of the stage.
Claims8
A substrate processing apparatus, comprising:
- a stage having an electrostatic chuck configured to attract a substrate;
- a measurement part configured to measure a temperature of the stage;
- and
- a detection part configured to detect an abnormality caused by attraction of the substrate by the electrostatic chuck, based on a fluctuation of the temperature of the stage.
An abnormality detection method for a substrate processing apparatus provided with a stage having an electrostatic chuck configured to attract a substrate, comprising:
- detecting an abnormality caused by attraction of the substrate by the electrostatic chuck, based on a fluctuation of a temperature of the stage.
Dependencies are inferred from the claim text.