Methods and systems for forming a layer comprising aluminum, titanium, and carbon

A method for forming a layer on a substrate, the method comprising:

• providing the substrate in a reaction chamber;
• executing a plurality of deposition cycles;
• wherein a deposition cycle comprises
• an aluminum precursor pulse, the aluminum precursor pulse comprising exposing the substrate to an aluminum precursor, the aluminum precursor comprising aluminum, a first alkyl ligand, and a second alkyl ligand, the first alkyl ligand and the second alkyl ligand being different;
• and,
• a transition metal precursor pulse, the transition metal precursor pulse comprising exposing the substrate to a transition metal precursor, the transition metal precursor comprising a transition metal;
• thus forming the layer on the substrate, the layer comprising the transition metal, the aluminum, and carbon.