Substrate processing apparatus, substrate processing method, gas regeneration system, and gas regeneration method
AssigneeKioxia Corporation
InventorHoroyuki Mizuno
Life of this patent
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Abstract
According to one embodiment, there is provided a gas regeneration method. The method includes setting a predetermined standard on a basis of a flow rate of rare gas set in a processing recipe. The method includes selecting a rare gas recovery step on a basis of the predetermined standard. The method includes, in the rare gas recovery step, guiding emission gas from a predetermined chamber to a rare gas regenerator. The method includes, in a step other than the rare gas recovery step, causing the emission gas to bypass the rare gas regenerator to discharge the emission gas.
Claims20
A gas regeneration method comprising:
- setting a predetermined standard on a basis of a flow rate of rare gas set in a processing recipe;
- selecting a rare gas recovery step on a basis of the predetermined standard;
- in the rare gas recovery step, guiding emission gas from a predetermined chamber to a rare gas regenerator;
- and
- in a step other than the rare gas recovery step, causing the emission gas to bypass the rare gas regenerator to discharge the emission gas.
A gas regeneration system comprising:
- a chamber;
- a gas exhaust system that is connected to the chamber and includes a gas regenerator;
- and
- a controller that sets a predetermined standard on a basis of a flow rate of rare gas set in a processing recipe, that selects a rare gas recovery step on a basis of the predetermined standard, that guides a emission gas to a rare gas regenerator in the rare gas recovery step, and that causes the emission gas to bypass the rare gas regenerator to discharge the emission gas in a step other than the rare gas recovery step.
A substrate processing apparatus comprising:
- a chamber;
- a gas supply system connected to the chamber;
- a gas exhaust system connected to the chamber;
- and
- a controller that controls the gas supply system and the gas exhaust system, wherein
- the gas exhaust system includes
- a first flow path,
- a second flow path,
- a flow path changer that switches between a first state in which the chamber communicates with the first flow path and a second state in which the chamber communicates with the second flow path, and
- a rare gas regenerator provided in the first flow path.
Dependencies are inferred from the claim text.